Composition and performance of annealing furnace

    The annealing furnace is a process used in the manufacture of semiconductor devices, which involves heating multiple semiconductor wafers to affect their electrical properties. Heat treatment is designed for different effects. The annealing furnace can heat the wafer to activate the dopants, convert the thin film into a thin film or convert the thin film into the wafer substrate interface, so that the deposited film is densely deposited. The annealing furnace can change the state of the grown film, repair the implanted damage, and move the doping Agents transfer dopants from one film to another or from the film into the wafer substrate.     The annealing furnace can be integrated into other furnace processing steps, such as oxidation, or can be processed by itself. The annealing furnace is completed by equipment specially designed for heating semiconductor wafers. The annealing furnace is an energy-saving periodic operating furnace with a super energy-saving structure and a fiber structure that saves 60% of electricity.

    Heat treatment furnaces are divided into annealing furnaces, quenching furnaces, tempering furnaces, normalizing furnaces, and quenching and tempering furnaces. They are mainly used for annealing large carbon steel and alloy steel parts; tempering surface hardened parts; welding parts stress relief annealing, aging and other heat treatment processes. Heating methods include electric heating, oil, gas, coal, hot air circulation. Annealing furnace is a new type of heat exchange equipment. The annealing furnace is an energy-saving periodic operating furnace with a super energy-saving structure and a fiber structure that saves 60% of electricity.

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