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Introduction of rapid annealing furnace

Overview:
The rapid annealing furnace uses an iodine tungsten lamp tube as the heating element, and the heating speed is extremely fast. It adopts the S-type thermocouple to measure the temperature and adopts the international fuzzy PID control. It has high temperature control accuracy <±5°C>, and rapid withdrawal The stove has a vacuum device and can work in a variety of atmospheres. It is just a small variety of annealing furnace
Technical parameters: 
1. Rapid heat treatment can be carried out under vacuum and inert gas (N2, Ar) environment;  
2. Large sample diameter: 4 inches;  
3. High temperature: 1000°C; 
4. High heating rate: 100°C/Second;  
5. High cooling speed: 80℃/Second;  
6. Temperature control accuracy: ±1%;  
7. Low vacuum degree ≤5×10-3 Torr; 
8. Power: infrared halogen tungsten lamp, 1,250 W/ea ×11 lamps; 
9. Dimensions: 760mm(W) × 400mm(D) × 400mm(H); Main features: 

1, Chamber: The cavity is gold-plated, and the gold layer helps uniform heat reflection; the cavity is square, With vacuum and gas ports. 
2. Substrate Holder: 4 inches, quartz. 
3. Heater: 11 infrared halogen tungsten lamps, water-cooled. 
4. Vacuum pump Pump: molecular turbo pump (TMP), ~ 10-6 Torr; rotary vane vacuum pump, ~ 5*10-3 Torr;
5. Gas Module (including mass flow controller, MFC) Gas Module: Controllable gas flow; 316 stainless steel tube, automatic welding, electrolytic polishing process, VCR interface, liquid helium leak detection reaches 10E-8 Torr. L/sec. . 
6, Control Module: Menu can be edited, multi-program rapid temperature control and processing.
Maintenance precautions:
1. After the furnace is used for a long time or not used for a long time, it should be baked at about 120°C for 1 hour, and used at about 300°C for 2 hours to avoid cracking the furnace. The furnace temperature should not exceed the rated temperature to avoid damage to the heating element and furnace lining. It is forbidden to directly pour various liquids and dissolved metals into the furnace to keep the furnace clean.
2. If the furnace uses a quartz tube, when the temperature is higher than 1000 ℃, the high temperature part of the quartz tube will appear opaque. This is called devitrification (also called devitrification), which is an inherent defect of continuous fused quartz tube, which is a normal phenomenon. .
3. When using a cold furnace, because the furnace is cold, to be highly endothermic, so the low temperature section easy too fast heating rate, the temperature rise of each period
rate of temperature difference is too difficult, heating rate should be set fully in consideration of the sintered material Physical and chemical properties, so as to avoid spraying and polluting the furnace tube.
4. Regularly check whether the electrical connection part of the temperature control system is in good contact, and pay special attention to whether the connection of each connection point of the heating element is tight.
5. After the furnace has been used for a period of time, if the vacuum is lowered, the temperature-resistant silicone ring between the stainless steel flanges can be replaced or the stainless steel flanges can be reinstalled or the vacuum system can be repaired to improve the overall vacuum of the system.
6. During the working process of the furnace, if the control deviation cannot be eliminated at about 300℃, the temperature display value does not match the program setting value or the swing is too large, check whether the parameter "M5, P, t" setting is accurate.
7. This furnace is suitable for the following working conditions:
(1) The ambient temperature is between -10 and 75°C.
(2) The relative humidity of the surrounding environment does not exceed 85%.
(3) There is no conductive dust, explosive gas or corrosive gas that can seriously damage metal and insulating materials around the furnace.
(4) There is no obvious tilt, vibration and bumps.
Application areas: 
rapid thermal annealing
rapid thermal oxidation, 
rapid thermal nitridation,
silicidation,
diffusion,
compound semiconductor annealing 
, annealing after ion implantation,
electrode alloying, 
crystal orientation and hardening

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